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Physics of Microfabrication: Front End Processing

6.774 · Electrical Engineering and Computer Science · Graduate · Fall 2004

Prof. Judy Hoyt, Prof. L. Rafael Reif

MIT · Tier 1

This course is offered to graduates and focuses on understanding the fundamental principles of the “front-end” processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new …

PhysicsMaterials Science and EngineeringMechanical EngineeringEngineeringScience & Math

The syllabus, on MIT OpenCourseWare

The full course — syllabus, assigned readings, problem sets, exams, and lecture notes — lives on OCW. These open the real thing:

Attribution

Prof. Judy Hoyt, Prof. L. Rafael Reif. 6.774 Physics of Microfabrication: Front End Processing. Fall 2004. Massachusetts Institute of Technology: MIT OpenCourseWare, https://ocw.mit.edu. License: CC BY-NC-SA 4.0.

Course materials are © their authors and licensed CC BY-NC-SA 4.0. CurrMana links to the source and does not re-host them.